Kasa Fa'apitoa
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Sulfur Tetrafluoride (SF4)
EINECS NO: 232-013-4
CAS NO: 7783-60-0 -
Nitrous Oxide (N2O)
Nitrous oxide, e ta'ua fo'i o le kesi talie, ose vaila'au mata'utia e iai le fua fa'a vaila'au N2O. O se kasa e le lanu, manogi manogi. O le N2O ose vaila'au e mafai ona lagolagoina le mu i lalo o nisi tulaga, ae e mautu i le vevela o le potu ma e iai sina aafiaga fa'ama'i. , ma e mafai ona talie ai tagata. -
Carbon Tetrafluoride (CF4)
O le carbon tetrafluoride, e taʻua foi o le tetrafluoromethane, o se kasa e leai ni lanu i le vevela masani ma le mamafa, e le mafai ona faʻafefe i le vai. O le kasa CF4 o loʻo faʻaaogaina nei le plasma etching gas i le microelectronics alamanuia. E fa'aaogaina fo'i e fai ma kesi leisa, fa'alili cryogenic, solvent, lubricant, insulating mea, ma coolant mo tubes detector infrared. -
Sulfuryl Fluoride (F2O2S)
Sulfuryl fluoride SO2F2, kasa oona, e masani ona faʻaaogaina e avea o se iniseti. Talu ai ona o le sulfuryl fluoride o loʻo i ai uiga o le faʻasalalau malosi ma le faʻaogaina, insecticide lautele-alaleo, maualalo fua, maualalo le aofaʻi o totoe, saoasaoa insecticidal saoasaoa, taimi faʻasalalau kesi puʻupuʻu, faʻaoga talafeagai i le maualalo o le vevela, leai se aʻafiaga i le fua o le germination ma maualalo oona, sili atu. E sili atu ma sili atu ona faʻaaogaina i faleteuoloa, vaʻa uta, fale, faʻatanoa vai, puipuiga o nai, ma isi. -
Silane (SiH4)
Silane SiH4 ose kesi e leai se lanu, oona ma malosi tele i le vevela masani ma le mamafa. Silane e faʻaaogaina lautele i le tuputupu aʻe o le epitaxial o le silikoni, mea mataʻutia mo le polysilicon, silicon oxide, silicon nitride, ma isi mea, solar cell, fiber optical, gaosiga tioata lanu, ma le faʻaaogaina o vailaʻau. -
Octafluorocyclobutane (C4F8)
Octafluorocyclobutane C4F8, mama kasa: 99.999%, masani ona faʻaaogaina e fai ma meaʻai aerosol propellant ma medium gas. E masani ona faʻaaogaina i le semiconductor PECVD (Plasma Enhance. Chemical Vapor Deposition) faagasologa, C4F8 o loʻo faʻaaogaina e fai ma sui mo CF4 poʻo C2F6, faʻaaogaina e pei o le faamamaina o le kesi ma le semiconductor process etching gas. -
Nitric Oxide (NO)
Nitric oxide gas o se fa'aputuga o le nitrogen ma le fua fa'atatau ole NO. Ose kasa e leai se lanu, e leai se manogi, e oona e le mafai ona solu ile vai. O le nitric oxide e matua'i fa'agaoioi ma fa'agaioi ma le okesene e fa'atupu ai le kesi fa'ama'i o le nitrogen dioxide (NO₂). -
Hydrogen Chloride (HCl)
Hydrogen chloride HCL Gas o se kasa e leai ni lanu ma se manogi manogi. O lona vaifofo vai e ta'ua o le hydrochloric acid, lea e lauiloa foi o le hydrochloric acid. O le hydrogen chloride e masani ona faʻaaogaina e fai ai vali, mea manogi, vailaʻau, chlorides eseese ma iniseti corrosion. -
Hexafluoropropylene (C3F6)
Hexafluoropropylene, fua fa'ama'i: C3F6, ose kasa e leai ni lanu i le vevela masani ma le mamafa. E masani lava ona faʻaaogaina e saunia ai vailaʻau faʻamaʻi eseese o loʻo i ai le fluorine, vailaʻau vailaʻau, mea faʻamaʻi afi, ma isi mea, ma e mafai foi ona faʻaaogaina e saunia ai mea polymer e iai le fluorine. -
Amonia (NH3)
Ole ammonia sua / ammonia anhydrous ose vaila'au mata'utia taua ma le tele o fa'aoga. E mafai ona fa'aogaina le ammonia vai e fai ma pusaaisa. E masani ona faʻaaogaina e gaosia ai le nitric acid, urea ma isi vailaʻau vailaʻau, ma e mafai foi ona faʻaaogaina e fai ma mea mata mo vailaʻau ma vailaau faʻasaina. I totonu o le fale puipui, e faʻaaogaina e fai ai mea faʻamalosi mo rockets ma fana.
