Carbon Tetrafluoride (CF4)

Fa'amatalaga Puupuu:

O le carbon tetrafluoride, e taʻua foi o le tetrafluoromethane, o se kasa e leai ni lanu i le vevela masani ma le mamafa, e le mafai ona faʻafefe i le vai. O le kasa CF4 o loʻo faʻaaogaina nei le plasma etching gas i le microelectronics alamanuia. E fa'aaogaina fo'i e fai ma kesi leisa, fa'alili cryogenic, solvent, lubricant, insulating mea, ma coolant mo tubes detector infrared.


Fa'amatalaga Oloa

Faailoga o oloa

Vaega Fa'atekinisi

Fa'amatalaga 99.999%
Okesene+Argon ≤1ppm
Nitrogen ≤4 ppm
Susū(H2O) ≤3 ppm
HF ≤0.1 ppm
CO ≤0.1 ppm
CO2 ≤1 ppm
SF6 ≤1 ppm
Halocarbynes ≤1 ppm
Aofa'i Fa'aleaga ≤10 ppm

O le carbon tetrafluoride ose hydrocarbon fa'ato'aga fa'atasi ai ma le fua fa'atatau CF4. E mafai ona fa'atatauina o se mea fa'ameamea fa'ameamea, methane halogenated, perfluorocarbon, po'o se fa'aputuga fa'ameamea. O le carbon tetrafluoride o se kasa e leai se lanu ma e leai se manogi, e le mafai ona solu ile vai, e mafai ona solu ile benzene ma le chloroform. Faʻamau i lalo o le vevela masani ma le mamafa, aloese mai mea faʻamaʻi malolosi, mea e mu pe mu. Kasa e le mafai ona mu, o le a faʻateleina le mamafa o totonu o le pusa pe a faʻaalia i le vevela maualuga, ma e iai le lamatiaga o le taʻe ma le pa. E mautu i kemikolo ma e le mu. Na'o le ammonia-sodium metal reagent e mafai ona galue i le vevela o le potu. O le carbon tetrafluoride o se kesi e mafua ai le aafiaga o le greenhouse. E matua mautu, e mafai ona nofo i le ea mo se taimi umi, ma o se kesi kesi malosi tele. O le carbon tetrafluoride o loʻo faʻaaogaina i le faʻagasologa o le plasma etching process o vaʻaiga tuʻufaʻatasia eseese. E fa'aaogaina fo'i e pei o se kasa leisa, ma fa'aaogaina i pusaaisa maualalo, solvents, lubricants, insulating material, ma coolants mo infrared detectors. O le kesi etching plasma sili ona fa'aaogaina i le alamanuia microelectronics. O se faʻafefiloi o le tetrafluoromethane high-purity gas ma le tetrafluoromethane high-purity gas and high-purity oxygen. E mafai ona faʻaaogaina lautele i le silicon, silicon dioxide, silicon nitride, ma tioata phosphosilicate. O le faʻaogaina o mea ata tifaga manifinifi e pei o le tungsten ma le tungsten e faʻaaogaina lautele i luga o le faʻamamaina o masini faʻaeletoroni, gaosiga o le sola, tekinolosi leisa, pusaaisa maualalo, suʻesuʻeina le leki, ma le faʻamalama i le gaosiga o masini lolomi. Fa'aaogaina e fai ma fa'a'a'a'a'ai maualalo ma le plasma dry etching technology mo feso'ota'iga tu'ufa'atasi. Lapataiga mo le teuina: Teu i totonu ose faleteuoloa kesi malulu, ea e le mu. Taofi mai le afi ma le vevela. Ole vevela ole teuina e le tatau ona sili atu ile 30°C. E tatau ona teu ese mai mea faigofie (mu) ma mea fa'ama'i, ma aloese mai le teuina fa'afefiloi. O le nofoaga e teu ai e tatau ona faʻapipiʻiina i masini e togafitia faʻalavelave faʻafuaseʻi.

Talosaga:

① Pusa:

O le Tetrafluoromethane e fa'aaogaina i nisi taimi e fai ma fa'aaisa maualalo le vevela.

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② Tusia:

E fa'aaogaina i mea fa'akomepiuta microfabrication na'o ia pe fa'atasi ma le okesene e avea o se plasma etchant mo silicon, silicon dioxide, ma silicon nitride.

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afifi masani:

Oloa Carbon TetrafluorideCF4
Tele o le afifi 40Ltr Cylinder 50Ltr Cylinder  
Fa'atumuga Net Weight/Cyl 30Kgs 38Kgs  
QTY utaina ile 20'Container 250 Cyls 250 Cyls
Aofa'i o le mamafa 7.5 Tone 9.5 Tone
Mamafa Tare Silinder 50Kgs 55Kgs
Valve CGA 580

Tulaga lelei:

①Mama maualuga, fale fou;

②ISO gaosi tusi faamaonia;

③Tuuina atu vave;

④Faiga su'esu'e i luga ole laiga mo le pulea lelei i laasaga uma;

⑤Manaoga maualuga ma le faʻagasologa faʻapitoa mo le faʻaogaina o le paʻu aʻo leʻi faʻatumu;


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