Fa'amatalaga | 99.999% |
Okesene+Argon | ≤1ppm |
Nitrogen | ≤4 ppm |
Susū(H2O) | ≤3 ppm |
HF | ≤0.1 ppm |
CO | ≤0.1 ppm |
CO2 | ≤1 ppm |
SF6 | ≤1 ppm |
Halocarbynes | ≤1 ppm |
Aofa'i Fa'aleaga | ≤10 ppm |
O le carbon tetrafluoride ose hydrocarbon fa'ato'aga fa'atasi ai ma le fua fa'atatau CF4. E mafai ona fa'atatauina o se mea fa'ameamea fa'ameamea, methane halogenated, perfluorocarbon, po'o se fa'aputuga fa'ameamea. O le carbon tetrafluoride o se kasa e leai se lanu ma e leai se manogi, e le mafai ona solu ile vai, e mafai ona solu ile benzene ma le chloroform. Faʻamau i lalo o le vevela masani ma le mamafa, aloese mai mea faʻamaʻi malolosi, mea e mu pe mu. Kasa e le mafai ona mu, o le a faʻateleina le mamafa o totonu o le pusa pe a faʻaalia i le vevela maualuga, ma e iai le lamatiaga o le taʻe ma le pa. E mautu i kemikolo ma e le mu. Na'o le ammonia-sodium metal reagent e mafai ona galue i le vevela o le potu. O le carbon tetrafluoride o se kesi e mafua ai le aafiaga o le greenhouse. E matua mautu, e mafai ona nofo i le ea mo se taimi umi, ma o se kesi kesi malosi tele. O le carbon tetrafluoride o loʻo faʻaaogaina i le faʻagasologa o le plasma etching process o vaʻaiga tuʻufaʻatasia eseese. E fa'aaogaina fo'i e pei o se kasa leisa, ma fa'aaogaina i pusaaisa maualalo, solvents, lubricants, insulating material, ma coolants mo infrared detectors. O le kesi etching plasma sili ona fa'aaogaina i le alamanuia microelectronics. O se faʻafefiloi o le tetrafluoromethane high-purity gas ma le tetrafluoromethane high-purity gas and high-purity oxygen. E mafai ona faʻaaogaina lautele i le silicon, silicon dioxide, silicon nitride, ma tioata phosphosilicate. O le faʻaogaina o mea ata tifaga manifinifi e pei o le tungsten ma le tungsten e faʻaaogaina lautele i luga o le faʻamamaina o masini faʻaeletoroni, gaosiga o le sola, tekinolosi leisa, pusaaisa maualalo, suʻesuʻeina le leki, ma le faʻamalama i le gaosiga o masini lolomi. Fa'aaogaina e fai ma fa'a'a'a'a'ai maualalo ma le plasma dry etching technology mo feso'ota'iga tu'ufa'atasi. Lapataiga mo le teuina: Teu i totonu ose faleteuoloa kesi malulu, ea e le mu. Taofi mai le afi ma le vevela. Ole vevela ole teuina e le tatau ona sili atu ile 30°C. E tatau ona teu ese mai mea faigofie (mu) ma mea fa'ama'i, ma aloese mai le teuina fa'afefiloi. O le nofoaga e teu ai e tatau ona faʻapipiʻiina i masini e togafitia faʻalavelave faʻafuaseʻi.
① Pusa:
O le Tetrafluoromethane e fa'aaogaina i nisi taimi e fai ma fa'aaisa maualalo le vevela.
② Tusia:
E fa'aaogaina i mea fa'akomepiuta microfabrication na'o ia pe fa'atasi ma le okesene e avea o se plasma etchant mo silicon, silicon dioxide, ma silicon nitride.
Oloa | Carbon TetrafluorideCF4 | ||
Tele o le afifi | 40Ltr Cylinder | 50Ltr Cylinder | |
Fa'atumuga Net Weight/Cyl | 30Kgs | 38Kgs | |
QTY utaina ile 20'Container | 250 Cyls | 250 Cyls | |
Aofa'i o le mamafa | 7.5 Tone | 9.5 Tone | |
Mamafa Tare Silinder | 50Kgs | 55Kgs | |
Valve | CGA 580 |
①Mama maualuga, fale fou;
②ISO gaosi tusi faamaonia;
③Tuuina atu vave;
④Faiga su'esu'e i luga ole laiga mo le pulea lelei i laasaga uma;
⑤Manaoga maualuga ma le faʻagasologa faʻapitoa mo le faʻaogaina o le paʻu aʻo leʻi faʻatumu;