Matou te fa'atinoina pea lo matou agaga o le "Fa'afouga fa'atupuina le alualu i luma, Tulaga maualuga le faia o mea e ola ai, Fa'atauga fa'atauga manuia, Sikoa fa'aaitalafu e tosina atu ai tagata fa'atau mo le Fa'atauga Fa'atauga Maualuga a China Carbon Tetrafluoride CF4 Gas mo Semiconductor Industry Etching, Matou te fa'afeiloa'ia uo mai so'o se ituaiga o olaga i aso uma e tulituliloa felagolagoma'i ma fausia se taeao sili atu le matagofie ma le matagofie.
Matou te fa'atinoina e le aunoa lo matou agaga o le "Fa'afouga e fa'atupuina ai le alualu i luma, Tulaga sili ona lelei le fa'atinoina o mea e ola ai, Fa'atauga fa'atauga manuia, Sikoa fa'aaitalafu e tosina ai tagata fa'atau moSaina CF4 Kasa Fa'a'a'ai, Tu'u kasa, O i matou o lau paaga faʻalagolago i maketi faavaomalo ma oloa sili ona lelei. O a matou mea lelei o mea fou, fetuutuunai ma faʻamaoni na fausia i le luasefulu tausaga talu ai. Matou te taulaʻi atu i le tuʻuina atu o auaunaga mo a matou tagata faʻatau e avea o se elemene autu i le faʻamalosia o matou vaʻaiga umi. O lo matou avanoa faifaipea o vaifofo maualuga i le tu'ufa'atasia ma la matou 'au'aunaga sili ona lelei a'o le'i fa'atau atu ma le mae'a ona fa'atau atu e fa'amautinoa ai le malosi o le fa'atauva i se maketi fa'alalolagi.
| Fa'amatalaga | 99.999% |
| Okesene+Argon | ≤1ppm |
| Nitrogen | ≤4 ppm |
| Susū(H2O) | ≤3 ppm |
| HF | ≤0.1 ppm |
| CO | ≤0.1 ppm |
| CO2 | ≤1 ppm |
| SF6 | ≤1 ppm |
| Halocarbynes | ≤1 ppm |
| Aofa'i Fa'aleaga | ≤10 ppm |
O le carbon tetrafluoride ose hydrocarbon halogenated ma le fua fa'atatau CF4. E mafai ona fa'atatauina o se mea fa'ameamea, methane halogenated, perfluorocarbon, po'o se mea fa'apipi'i fa'amasani. O le carbon tetrafluoride o se kasa e leai se lanu ma e leai se manogi, e le mafai ona solu ile vai, e mafai ona solu ile benzene ma le chloroform. Taofi i lalo o le vevela masani ma le mamafa, aloese mai mea faʻamaʻi malolosi, mea e mu pe mu. Kasa e le mafai ona mu, o le a faʻateleina le mamafa o totonu o le pusa pe a faʻaalia i le vevela maualuga, ma e iai le lamatiaga o le taʻe ma le pa. E mautu i kemikolo ma e le mu. Na'o le ammonia-sodium metal reagent e mafai ona galue i le vevela o le potu. O le carbon tetrafluoride o se kesi e mafua ai le aafiaga o le greenhouse. E matua mautu, e mafai ona tumau i le ea mo se taimi umi, ma o se kesi kesi malosi tele. O le carbon tetrafluoride o loʻo faʻaaogaina i le faʻagasologa o le plasma etching process o vaʻaiga tuʻufaʻatasia eseese. E fa'aaogaina fo'i e pei o se kasa leisa, ma fa'aaogaina i pusaaisa maualalo, solvents, lubricants, insulating material, ma coolants mo infrared detectors. O le kesi etching plasma sili ona fa'aaogaina i le pisinisi microelectronics. O se faʻafefiloi o le tetrafluoromethane high-purity gas ma le tetrafluoromethane high-purity gas ma maualuga-mama okesene. E mafai ona faʻaaogaina lautele i le silicon, silicon dioxide, silicon nitride, ma tioata phosphosilicate. O le faʻaogaina o mea ata tifaga manifinifi e pei o le tungsten ma le tungsten e faʻaaogaina lautele i luga o le faʻamamaina o masini faʻaeletoroni, gaosiga o le sola, tekinolosi leisa, pusaaisa maualalo, suʻesuʻeina le leki, ma le faʻamalama i le gaosiga o masini lolomi. Fa'aaogaina e fai ma fa'a'a'a'a'ai maualalo ma le plasma dry etching technology mo feso'ota'iga tu'ufa'atasi. Lapataiga mo le teuina: Teu i totonu ose faleteuoloa kesi malulu, ea e le mu. Taofi mai le afi ma le vevela. Ole vevela ole teuina e le tatau ona sili atu ile 30°C. E tatau ona teu ese mai mea faigofie (mu) ma mea fa'ama'i, ma aloese mai le teuina fa'afefiloi. O le nofoaga e teu ai e tatau ona faʻapipiʻiina i masini faʻalavelave faʻafuaseʻi liki.
① Pusa:
O le Tetrafluoromethane e fa'aaogaina i nisi taimi e fai ma fa'aaisa maualalo le vevela.
② Tusia:
E fa'aaogaina i mea fa'akomepiuta microfabrication na'o ia pe fa'atasi ma le okesene e pei o se plasma etchant mo silicon, silicon dioxide, ma silicon nitride.
| Oloa | Carbon Tetrafluoride CF4 | ||
| Tele o le afifi | 40Ltr Cylinder | 50Ltr Cylinder | |
| Fa'atumuga Net Weight/Cyl | 30Kgs | 38Kgs | |
| QTY utaina ile 20'Container | 250 Cyls | 250 Cyls | |
| Aofa'i o le mamafa | 7.5 Tone | 9.5 Tone | |
| Mamafa Tare Silinder | 50Kgs | 55Kgs | |
| Valve | CGA 580 | ||
①Mama maualuga, fale fou;
②ISO gaosi tusi faamaonia;
③Tuuina atu vave;
④Faiga su'esu'e i luga ole laiga mo le pulea lelei i laasaga uma;
⑤Manaoga maualuga ma le faʻagasologa faʻapitoa mo le faʻaogaina o le paʻu aʻo leʻi faʻatumu;Matou te fa'atinoina pea lo matou agaga o le "Fa'afouga fa'atupuina le alualu i luma, Tulaga maualuga le faia o mea e ola ai, Fa'atauga fa'atauga manuia, Sikoa fa'aaitalafu e tosina atu ai tagata fa'atau mo le Fa'atauga Fa'atauga Maualuga a China Carbon Tetrafluoride CF4 Gas mo Semiconductor Industry Etching, Matou te fa'afeiloa'ia uo mai so'o se ituaiga o olaga i aso uma e tulituliloa felagolagoma'i ma fausia se taeao sili atu le matagofie ma le matagofie.
Fa'atauga vevelaSaina CF4 Kasa Fa'a'a'ai, Tu'u kasa, O i matou o lau paaga faʻalagolago i maketi faavaomalo ma oloa sili ona lelei. O a matou mea lelei o mea fou, fetuutuunai ma faʻamaoni na fausia i le luasefulu tausaga talu ai. Matou te taulaʻi atu i le tuʻuina atu o auaunaga mo a matou tagata faʻatau e avea o se elemene autu i le faʻamalosia o matou vaʻaiga umi. O lo matou avanoa faifaipea o vaifofo maualuga i le tu'ufa'atasia ma la matou 'au'aunaga sili ona lelei a'o le'i fa'atau atu ma le mae'a ona fa'atau atu e fa'amautinoa ai le malosi o le fa'atauva i se maketi fa'alalolagi.