O le tausisia o lau mataupu faavae o le "lelei, fesoasoani, faʻatinoga ma le tuputupu aʻe", ua matou mauaina faʻatuatuaga ma faʻafetai mai le atunuʻu ma le lalolagi atoa mo PriceList taugofie mo Saina High Purity CF4 Gas mo Semiconductor Industry Etching, O la matou manatu lagolago o le faʻamaoni, faʻamalosi, moni. ma mea fou. Faatasi ai ma le fesoasoani, o le a sili atu le lelei.
O le tausisia o lau mataupu faavae o le "lelei, fesoasoani, faatinoga ma le tuputupu aʻe", ua matou maua faʻatuatuaga ma faʻafetai mai tagata faʻatau ma le lalolagi atoa moSaina CF4 Kasa Fa'a'a'ai, Tu'u kasa, O la matou kamupani o le a tausisi i le "Uiga muamua,, atoatoa e faavavau, tagata-faatatau, tekinolosi fou" filosofia pisinisi. Galulue malosi e faʻaauau pea le alualu i luma, faʻafouina i le alamanuia, faia taumafaiga uma i le atinaʻe muamua. Matou te taumafai i le mea sili matou te mafaia e fausia ai le faʻataʻitaʻiga faʻasaienisi, ia aʻoaʻoina le tele o tomai faʻapolofesa, ia atiaʻe le gaosiga o masini gaosiga ma le gaosiga o gaosiga, ia fatuina oloa muamua-valaau lelei, tau talafeagai, maualuga o le auaunaga, vave tuʻuina atu, e tuʻuina atu ia te oe le fatuina tau fou .
Fa'amatalaga | 99.999% |
Okesene+Argon | ≤1ppm |
Nitrogen | ≤4 ppm |
Susū(H2O) | ≤3 ppm |
HF | ≤0.1 ppm |
CO | ≤0.1 ppm |
CO2 | ≤1 ppm |
SF6 | ≤1 ppm |
Halocarbynes | ≤1 ppm |
Aofa'i Fa'aleaga | ≤10 ppm |
O le carbon tetrafluoride ose hydrocarbon fa'ato'aga fa'atasi ai ma le fua fa'atatau CF4. E mafai ona fa'atatauina o se mea fa'ameamea fa'ameamea, methane halogenated, perfluorocarbon, po'o se fa'aputuga fa'ameamea. O le carbon tetrafluoride o se kasa e leai se lanu ma e leai se manogi, e le mafai ona solu ile vai, e mafai ona solu ile benzene ma le chloroform. Faʻamau i lalo o le vevela masani ma le mamafa, aloese mai mea faʻamaʻi malolosi, mea e mu pe mu. Kasa e le mafai ona mu, o le a faʻateleina le mamafa o totonu o le pusa pe a faʻaalia i le vevela maualuga, ma e iai le lamatiaga o le taʻe ma le pa. E mautu i kemikolo ma e le mu. Na'o le ammonia-sodium metal reagent e mafai ona galue i le vevela o le potu. O le carbon tetrafluoride o se kesi e mafua ai le aafiaga o le greenhouse. E matua mautu, e mafai ona nofo i le ea mo se taimi umi, ma o se kesi kesi malosi tele. O le carbon tetrafluoride o loʻo faʻaaogaina i le faʻagasologa o le plasma etching process o vaʻaiga tuʻufaʻatasia eseese. E fa'aaogaina fo'i e pei o se kasa leisa, ma fa'aaogaina i pusaaisa maualalo, solvents, lubricants, insulating material, ma coolants mo infrared detectors. O le kesi etching plasma sili ona fa'aaogaina i le alamanuia microelectronics. O se faʻafefiloi o le tetrafluoromethane high-purity gas ma le tetrafluoromethane high-purity gas and high-purity oxygen. E mafai ona faʻaaogaina lautele i le silicon, silicon dioxide, silicon nitride, ma tioata phosphosilicate. O le faʻaogaina o mea ata tifaga manifinifi e pei o le tungsten ma le tungsten e faʻaaogaina lautele i luga o le faʻamamaina o masini faʻaeletoroni, gaosiga o le sola, tekinolosi leisa, pusaaisa maualalo, suʻesuʻeina le leki, ma le faʻamalama i le gaosiga o masini lolomi. Fa'aaogaina e fai ma fa'a'a'a'a'ai maualalo ma le plasma dry etching technology mo feso'ota'iga tu'ufa'atasi. Lapataiga mo le teuina: Teu i totonu ose faleteuoloa kesi malulu, ea e le mu. Taofi mai le afi ma le vevela. Ole vevela ole teuina e le tatau ona sili atu ile 30°C. E tatau ona teu ese mai mea faigofie (mu) ma mea fa'ama'i, ma aloese mai le teuina fa'afefiloi. O le nofoaga e teu ai e tatau ona faʻapipiʻiina i masini e togafitia faʻalavelave faʻafuaseʻi.
① Pusa:
O le Tetrafluoromethane e fa'aaogaina i nisi taimi e fai ma fa'aaisa maualalo le vevela.
② Tusia:
E fa'aaogaina i mea fa'akomepiuta microfabrication na'o ia pe fa'atasi ma le okesene e avea o se plasma etchant mo silicon, silicon dioxide, ma silicon nitride.
Oloa | Carbon Tetrafluoride CF4 | ||
Tele o le afifi | 40Ltr Cylinder | 50Ltr Cylinder | |
Fa'atumuga Net Weight/Cyl | 30Kgs | 38Kgs | |
QTY utaina ile 20'Container | 250 Cyls | 250 Cyls | |
Aofa'i o le mamafa | 7.5 Tone | 9.5 Tone | |
Mamafa Tare Silinder | 50Kgs | 55Kgs | |
Valve | CGA 580 |
①Mama maualuga, fale fou;
②ISO gaosi tusi faamaonia;
③Tuuina atu vave;
④Faiga su'esu'e i luga ole laiga mo le pulea lelei i laasaga uma;
⑤Manaoga maualuga ma le faʻagasologa faʻapitoa mo le faʻaogaina o le paʻu aʻo leʻi faʻatumu;O le tausisia o lau mataupu faavae o le "lelei, fesoasoani, faʻatinoga ma le tuputupu aʻe", ua matou mauaina faʻatuatuaga ma faʻafetai mai le atunuʻu ma le lalolagi atoa mo PriceList taugofie mo Saina High Purity CF4 Gas mo Semiconductor Industry Etching, O la matou manatu lagolago o le faʻamaoni, faʻamalosi, moni. ma mea fou. Faatasi ai ma le fesoasoani, o le a sili atu le lelei.
Tau taugofie moSaina CF4 Kasa Fa'a'a'ai, Tu'u kasa, O la matou kamupani o le a tausisi i le "Uiga muamua,, atoatoa e faavavau, tagata-faatatau, tekinolosi fou" filosofia pisinisi. Galulue malosi e faʻaauau pea le alualu i luma, faʻafouina i le alamanuia, faia taumafaiga uma i le atinaʻe muamua. Matou te taumafai i le mea sili matou te mafaia e fausia ai le faʻataʻitaʻiga faʻasaienisi, ia aʻoaʻoina le tele o tomai faʻapolofesa, ia atiaʻe le gaosiga o masini gaosiga ma le gaosiga o gaosiga, ia fatuina oloa muamua-valaau lelei, tau talafeagai, maualuga o le auaunaga, vave tuʻuina atu, e tuʻuina atu ia te oe le fatuina tau fou .